Helia-D
Helia-D Officina Youth Concept Peeling Solution
Gentle chemical exfoliator with 10% glycolic acid and 1% mandelic acid.
7
Good
5
Neutral
0
Caution
0
Avoid
58% good
42% neutral
0% caution
0% avoid
About product
- Brand
- Helia-D
- Ingredients
- 12
- Actives
- 6
Full ingredient list — Helia-D Officina Youth Concept Peeling Solution
Hover a row · click for the card
Water
Aqua
Solvent
→
Propanediol
Zemea
Glycolic Acid
Buffering
→
Pentylene Glycol
Skin conditioning Solvent
→
Glycerin
Glycerol
Denaturant Hair conditioning Humectant Oral care Perfuming Skin conditioning Skin protecting Solvent Viscosity controlling
→
Methyl Gluceth-20
Humectant Moisturising
→
Sodium Hydroxide
lye
Buffering Denaturant
→
Mandelic Acid
Antimicrobial
→
Sodium PCA
Sodium Pyrrolidone Carboxylic Acid
Antistatic Hair conditioning Humectant Skin conditioning
→
Phenoxyethanol
Preservative
→
Biosaccharide Gum-1
Skin conditioning
→
Panthenol
Pro-Vitamin B5
Antistatic Hair conditioning Skin conditioning
→
Состав
Water, Propanediol, Glycolic Acid, Pentylene Glycol, Glycerin, Methyl Gluceth-20, Sodium Hydroxide, Mandelic Acid, Sodium PCA, Phenoxyethanol, Biosaccharide Gum-1, Panthenol
Glycolic Acid
Buffering
→
Glycerin
Glycerol
Denaturant Hair conditioning Humectant Oral care Perfuming Skin conditioning Skin protecting Solvent Viscosity controlling
→
Mandelic Acid
Antimicrobial
→
Sodium PCA
Sodium Pyrrolidone Carboxylic Acid
Antistatic Hair conditioning Humectant Skin conditioning
→
Biosaccharide Gum-1
Skin conditioning
→
Panthenol
Pro-Vitamin B5
Antistatic Hair conditioning Skin conditioning
→
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