Photozyme
Photozyme Vitamin C+e Ferulic Acid Serum With Dna
15% l-ascorbic acid (vitamin c), 1% vitamin e, 0.5% ferulic acid and loaded with dna repair enzymes
6
Good
9
Neutral
0
Caution
0
Avoid
40% good
60% neutral
0% caution
0% avoid
Full ingredient list — Photozyme Vitamin C+e Ferulic Acid Serum With Dna
Hover a row · click for the card
Water
Aqua
Solvent
→
Ethoxydiglycol
Humectant Perfuming Solvent
→
Ascorbic Acid
Vitamin C, L-ascorbic acid
Antioxidant Buffering Masking Skin conditioning
→
Propylene Glycol
Humectant Skin conditioning Solvent Viscosity controlling
→
Glycerin
Glycerol
Denaturant Hair conditioning Humectant Oral care Perfuming Skin conditioning Skin protecting Solvent Viscosity controlling
→
Sodium Hyaluronate
Humectant Skin conditioning
→
Panthenol
Pro-Vitamin B5
Antistatic Hair conditioning Skin conditioning
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Laureth-23
Cleansing Emulsifying Surfactant
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Ferulic Acid
Antimicrobial Antioxidant
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Photolyase Endonuclease
Arabidopsis Thaliana Extract
Antioxidant
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Tocopherol
Vitamin E
Antioxidant Masking Skin conditioning
→
Phenoxyethanol
Preservative
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Ethylhexylglycerin
Deodorant Skin conditioning
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Triethanolamine
Buffering Emulsifying Masking Surfactant
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Состав
Water, Ethoxydiglycol, Ascorbic Acid, Propylene Glycol, Glycerin, Sodium Hyaluronate, Panthenol, Laureth-23, Ferulic Acid, Photolyase Endonuclease, Arabidopsis Thaliana Extract, Tocopherol, Phenoxyethanol, Ethylhexylglycerin, Triethanolamine
Ascorbic Acid
Vitamin C, L-ascorbic acid
Antioxidant Buffering Masking Skin conditioning
→
Glycerin
Glycerol
Denaturant Hair conditioning Humectant Oral care Perfuming Skin conditioning Skin protecting Solvent Viscosity controlling
→
Sodium Hyaluronate
Humectant Skin conditioning
→
Panthenol
Pro-Vitamin B5
Antistatic Hair conditioning Skin conditioning
→
Ferulic Acid
Antimicrobial Antioxidant
→
Arabidopsis Thaliana Extract
Antioxidant
→
Tocopherol
Vitamin E
Antioxidant Masking Skin conditioning
→
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